Title: Metallic nanomesh for high-performance transparent electromagnetic shielding 

Author(s): Liang, ZC (Liang, Zhuocheng); Zhao, ZY (Zhao, Zeyu); Pu, MB (Pu, Mingbo); Luo, J (Luo, Jun); Xie, X (Xie, Xin); Wang, YQ (Wang, Yanqing); Guo, YH (Guo, Yinghui); Ma, XL (Ma, Xiaoliang); Luo, XG (Luo, Xiangang) 

Source: OPTICAL MATERIALS EXPRESS  Volume: 10  Issue: 3  Pages: 796-806  DOI: 10.1364/OME.386830  Published: MAR 1 2020   

Abstract: This paper reports a high-performance transparent electromagnetic shielding material based on an ultrathin and large-area metallic nanomesh, which was fabricated by a facile and rational process utilizing ultraviolet lithography and the ion beam etching technique. Measurements reveal that a single-layer metallic nanomesh can harvest excellent shielding effectiveness exceeding 40 dB in the wide frequency range from 500 MHz to 40 GHz. Besides, efficient light transmittance (85% at 550 nm) is achieved in both visible and near-infrared regions. Furthermore, the proposed structure remains excellent performance at wide incident angles even up to 50 degrees. Hence, it is believed that this metallic nanomesh with easy fabrication can be a potential alternative in the transparent electromagnetic shielding domain. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement 

ISSN: 2159-3930