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Fabrication of Hybrid Soft-Nanoimprint Stamp with Sub-100 nm Resolution Based on Thiol-Ene

Author(s): Zhang, M (Zhang, Man); Deng, QL (Deng, Qiling); Shi, LF (Shi, Lifang); Pang, H (Pang, Hui); Cao, A (Cao, Axiu); Hu, S (Hu, Song)
Source: JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY  Volume: 16  Issue: 12  Pages: 12316-12320  DOI: 10.1166/jnn.2016.12970  Published: DEC 2016 
Abstract: We proposed a method for fabrication of hybrid soft-nanoimprint stamp with sub-100 nm resolution based on UV-curable thiol-ene polymer and via soft lithography which consisted of rigid structure layer and flexible substrate. An elastic film was firstly prepared as the flexible substrate and the thiol-ene prepolymer was then spin-coated onto the master mold with nanostructures. The flexible film was imprinted against the resistant layer to make a conformal contact. The thiol-ene formed a cross-linked polymer network after UV light treatment via "click chemistry" at ambient conditions and without inhabitation from oxygen or moisture. The hybrid stamp was achieved after releasing the mold. The rigid thiol-ene nanostructure had high-resolution due to excellent properties. The hybrid stamps, composed of rigid cross-linked thiol-ene features with sub-100 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate, were fabricated based on the new method.
IDS Number: EB3PY
ISSN: 1533-4880
eISSN: 1533-4899

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